Linear Ion Source "LION"
Robust and scalable design! High-energy, strongly focused beam.
"LION" is a component suitable for pre-treatment and surface modification. It removes hydrocarbons through argon processing and can add oxygen if necessary. The ion beam is strongly focused and has high energy. It is an ideal device for inline film deposition systems that require physical etching, and due to its simple and robust design, the ion source can be easily scaled up. The main applications are large-area glass film deposition and metal foil deposition. 【Features】 ■ Removes hydrocarbons through argon processing and can add oxygen if necessary ■ Available in an external version with adjustable angle and a flange-mounted version ■ Robust and scalable design ■ High-energy, strongly focused beam ■ Pre-treatment of various types of substrate materials *For more details, please refer to the PDF materials or feel free to contact us.
- Company：フォンアルデンヌジャパン
- Price：Other
